Negative Photoresist Cross-Section Quiz

To pattern the Si3N4 layer on the Si substrate (correct)

To expose the negative photoresist on the Si3N4 layer

To deposit a layer of Si3N4 on the Si substrate

To remove the Si3N4 layer from the Si substrate

1 point

500 nm and 1 point thick (correct)

500 nm

The thickness is not specified

Chemically amplified photoresist

The type of photoresist is not specified

Positive photoresist

Negative photoresist (correct)

<p>Si substrate → Si3N4 → NPR</p> Signup and view all the answers

<p>A defect in the photomask</p> Signup and view all the answers