Oxidation in Semiconductor Manufacturing
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Questions and Answers

Which type of oxidation process uses high-purity oxygen gas to oxidize silicon?

  • Rapid Thermal Process
  • Steam Oxidation
  • Wet Oxidation
  • Dry Oxidation (correct)

What is a characteristic of dry oxidation in terms of oxide growth?

  • Even on low temperatures
  • Fast growth
  • Slow growth (correct)
  • Less quality

In which oxidation process does silicon oxidize more rapidly compared to the other processes?

  • Steam Oxidation
  • Rapid Thermal Process
  • Wet Oxidation (correct)
  • Dry Oxidation

What is the oxidizing element in wet oxidation made of?

<p>Hydroxyl ion (B)</p> Signup and view all the answers

Which parameter does not affect the oxidation growth rate in the diffusion-controlled second phase?

<p>Rapid Thermal Process (B)</p> Signup and view all the answers

What makes oxide layers produced via dry oxidation higher quality compared to those made with wet oxidation?

<p>High breakdown voltage (D)</p> Signup and view all the answers

Which process involves growing a layer of silicon dioxide on a silicon wafer?

<p>Thermal Oxidation (D)</p> Signup and view all the answers

What is the purpose of the Wafer Scrubber described in the text?

<p>To clean the wafers mechanically with brushes (C)</p> Signup and view all the answers

What are the two stages involved in the growth of silicon dioxide during Thermal Oxidation?

<p>Linear stage and Parabolic stage (B)</p> Signup and view all the answers

Which mixture is effective for removing metals from the wafer surface?

<p>A mixture of hydrochloric acid, hydrogen peroxide, and DI water (A)</p> Signup and view all the answers

Which method is used for rinsing wafers with overflow, dump, and spray methods?

<p>Wafer Rinse (A)</p> Signup and view all the answers

In Wafer Scrubbing, what is typically used for mechanical cleaning of wafers?

<p>Brushes or pads (A)</p> Signup and view all the answers

What is the main advantage of Rapid Thermal Processing (RTP) over conventional furnace systems?

<p>Higher temperature uniformity and faster processing (C)</p> Signup and view all the answers

How does the silicon dioxide layer act as a barrier in the context of doping?

<p>It decreases dopant diffusion into the silicon substrate (B)</p> Signup and view all the answers

What is the primary function of the silicon dioxide layer in surface passivation?

<p>Serving as a physical and chemical barrier (B)</p> Signup and view all the answers

Why is silicon dioxide suitable for barrier-layer formation in semiconductor devices?

<p>It provides a physical and chemical barrier to dopant diffusion (C)</p> Signup and view all the answers

Which property of silicon dioxide makes it effective in safeguarding surfaces during fabrication processes?

<p>Hard and non-porous nature (B)</p> Signup and view all the answers

What is the purpose of doping in silicon wafers?

<p>To alter electrical properties intentionally (C)</p> Signup and view all the answers

What is the purpose of surface dielectrics in semiconductor devices?

<p>To prevent interference with adjacent circuitry by acting as insulators (D)</p> Signup and view all the answers

In a semiconductor device, what role does the device dielectric play?

<p>It acts as an insulator between metal and semiconductor (B)</p> Signup and view all the answers

Why is precise temperature control crucial in oxidation furnaces used in semiconductor manufacturing?

<p>To control the rate of semiconductor growth inside the furnace (A)</p> Signup and view all the answers

What is one basic function of a wafer scrubber/cleaner in semiconductor manufacturing?

<p>To clean wafers from contaminants and particles (A)</p> Signup and view all the answers

Which type of furnace is known for its capability to introduce oxygen or water molecule oxidants?

<p>Rapid thermal processor (RTP) (D)</p> Signup and view all the answers

What is the main reason for using silicon dioxide layers in semiconductor devices?

<p>To serve as a dielectric material between different circuitry layers (B)</p> Signup and view all the answers

What is the main purpose of the oxidation stage in semiconductor device manufacturing?

<p>To generate a protective layer of silicon dioxide on the wafer's surface (C)</p> Signup and view all the answers

What is the industry standard method for cleaning wafer surfaces?

<p>Wet chemistry using RCA clean (SC-1 and SC-2 stages) (B)</p> Signup and view all the answers

How are oxidized wafers inspected in the semiconductor manufacturing process?

<p>For under grown oxide layers and uneven oxidation (C)</p> Signup and view all the answers

What happens to wafers with defects detected during inspection?

<p>They pass through the process based on defect severity (B)</p> Signup and view all the answers

What is the effect of inspection failure on oxidized wafers?

<p>Leads to under grown oxide layers and uneven oxidation (A)</p> Signup and view all the answers

How are wafers that need to be oxidized prepared before entering the oxidation furnace?

<p>They are first cleaned to remove contaminants and obtain a smooth polished surface (A)</p> Signup and view all the answers

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