30 Questions
Which type of oxidation process uses high-purity oxygen gas to oxidize silicon?
Dry Oxidation
What is a characteristic of dry oxidation in terms of oxide growth?
Slow growth
In which oxidation process does silicon oxidize more rapidly compared to the other processes?
Wet Oxidation
What is the oxidizing element in wet oxidation made of?
Hydroxyl ion
Which parameter does not affect the oxidation growth rate in the diffusion-controlled second phase?
Rapid Thermal Process
What makes oxide layers produced via dry oxidation higher quality compared to those made with wet oxidation?
High breakdown voltage
Which process involves growing a layer of silicon dioxide on a silicon wafer?
Thermal Oxidation
What is the purpose of the Wafer Scrubber described in the text?
To clean the wafers mechanically with brushes
What are the two stages involved in the growth of silicon dioxide during Thermal Oxidation?
Linear stage and Parabolic stage
Which mixture is effective for removing metals from the wafer surface?
A mixture of hydrochloric acid, hydrogen peroxide, and DI water
Which method is used for rinsing wafers with overflow, dump, and spray methods?
Wafer Rinse
In Wafer Scrubbing, what is typically used for mechanical cleaning of wafers?
Brushes or pads
What is the main advantage of Rapid Thermal Processing (RTP) over conventional furnace systems?
Higher temperature uniformity and faster processing
How does the silicon dioxide layer act as a barrier in the context of doping?
It decreases dopant diffusion into the silicon substrate
What is the primary function of the silicon dioxide layer in surface passivation?
Serving as a physical and chemical barrier
Why is silicon dioxide suitable for barrier-layer formation in semiconductor devices?
It provides a physical and chemical barrier to dopant diffusion
Which property of silicon dioxide makes it effective in safeguarding surfaces during fabrication processes?
Hard and non-porous nature
What is the purpose of doping in silicon wafers?
To alter electrical properties intentionally
What is the purpose of surface dielectrics in semiconductor devices?
To prevent interference with adjacent circuitry by acting as insulators
In a semiconductor device, what role does the device dielectric play?
It acts as an insulator between metal and semiconductor
Why is precise temperature control crucial in oxidation furnaces used in semiconductor manufacturing?
To control the rate of semiconductor growth inside the furnace
What is one basic function of a wafer scrubber/cleaner in semiconductor manufacturing?
To clean wafers from contaminants and particles
Which type of furnace is known for its capability to introduce oxygen or water molecule oxidants?
Rapid thermal processor (RTP)
What is the main reason for using silicon dioxide layers in semiconductor devices?
To serve as a dielectric material between different circuitry layers
What is the main purpose of the oxidation stage in semiconductor device manufacturing?
To generate a protective layer of silicon dioxide on the wafer's surface
What is the industry standard method for cleaning wafer surfaces?
Wet chemistry using RCA clean (SC-1 and SC-2 stages)
How are oxidized wafers inspected in the semiconductor manufacturing process?
For under grown oxide layers and uneven oxidation
What happens to wafers with defects detected during inspection?
They pass through the process based on defect severity
What is the effect of inspection failure on oxidized wafers?
Leads to under grown oxide layers and uneven oxidation
How are wafers that need to be oxidized prepared before entering the oxidation furnace?
They are first cleaned to remove contaminants and obtain a smooth polished surface
Learn about the critical oxidation stage of a silicon wafer in semiconductor device manufacturing, which generates a protective layer of silicon dioxide. This quiz covers the importance and process of oxidation in semiconductor fabrication.
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