Semiconductor Device Structures and Metallization Techniques
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Questions and Answers

What is the primary purpose of the epitaxial layer in a bipolar circuit?

  • To provide isolation between devices
  • To control the doping concentration in the device (correct)
  • To serve as the base region of the transistor
  • To act as a conducting layer for the circuit

What is the main purpose of the intermetal dielectric (IMD) layers in a device structure?

  • To enhance the thermal conductivity of the device
  • To control the stress in the device structure
  • To act as a conducting path between metal layers
  • To provide electrical insulation between metal layers (correct)

Which of the following is NOT a common technique for layer deposition in semiconductor device fabrication?

  • Sputtering
  • Physical vapor deposition
  • Chemical vapor deposition
  • Spin coating (correct)

What is the primary purpose of the final passivation layer in a semiconductor device?

<p>To act as a barrier against environmental contaminants (B)</p> Signup and view all the answers

What is the main advantage of using the dual-damascene process for metal deposition?

<p>It reduces the number of processing steps required (D)</p> Signup and view all the answers

Which of the following is NOT a general criterion that all films must meet for semiconductor use?

<p>Electrical conductivity (D)</p> Signup and view all the answers

What was the main performance barrier that aluminum metallization ran into as circuits reached 100MHz speeds?

<p>Signals could not move fast enough through the metal system to prevent processing delays. (D)</p> Signup and view all the answers

What is the main advantage of using copper over aluminum as a conducting metal?

<p>Copper is more resistant to electromigration than aluminum. (B)</p> Signup and view all the answers

What are some of the drawbacks of using copper as a conducting metal?

<p>Copper requires the use of barrier metals to keep it out of the silicon. (C)</p> Signup and view all the answers

What are some of the deposition methods that can be used for copper?

<p>CVD, sputtering, electroless plating, and electrolytic plating. (A)</p> Signup and view all the answers

What was the resistance value of aluminum compared to copper?

<p>Aluminum had a resistance of 3.1 μΩ-cm, while copper had a resistance of 1.7 μΩ-cm. (B)</p> Signup and view all the answers

What companies were the first to announce the availability of production copper-based devices?

<p>IBM and Motorola. (C)</p> Signup and view all the answers

What is a key advantage of LPCVD systems?

<p>Good step coverage and uniformity (D)</p> Signup and view all the answers

How is the pressure range typically reduced in an LPCVD system?

<p>By connecting the tube to a vacuum pump (D)</p> Signup and view all the answers

What is a disadvantage of using a hot-wall LPCVD system?

<p>Formation of particles on the inside wall surface (A)</p> Signup and view all the answers

Why do some systems in LPCVD have injectors positioned directly over the wafers?

<p>To improve gas mixing and deposition uniformity (D)</p> Signup and view all the answers

What additional component needs to be added to an LPCVD system to reduce pressure in the chamber?

<p>A vacuum pump (C)</p> Signup and view all the answers

What is one advantage of the horizontal LPCVD system design discussed in the text?

<p>Lower exposure to particles (B)</p> Signup and view all the answers

What is the main advantage of an epitaxial film in terms of doping?

<p>Epitaxial films can be grown with a wider range of dopant concentrations compared to silicon wafers. (C)</p> Signup and view all the answers

How is doping achieved in an epitaxial film?

<p>By adding a dopant gas stream to the deposition reactants in the CVD chamber. (B)</p> Signup and view all the answers

What is the classic epitaxial film used in bipolar technology?

<p>An N-type epitaxial film on a P-type wafer. (D)</p> Signup and view all the answers

What is the purpose of the lower temperature used in epitaxial film growth?

<p>To improve the uniformity of the crystal structure in the film. (A)</p> Signup and view all the answers

What is the upper limit of dopant concentration that can be achieved in an epitaxial film?

<p>10^19 atoms/cm^3 (B)</p> Signup and view all the answers

Which statement about in situ CVD doping is true?

<p>It has the lowest dopant carrier mobility due to grain-boundary trapping. (B)</p> Signup and view all the answers

What advantage does doped polysilicon have?

<p>It has a good ohmic contact with the wafer silicon and can be oxidized to form an insulating layer. (D)</p> Signup and view all the answers

Why are polysilicon oxides considered to be of lower quality than thermal oxides grown on single-crystal silicon?

<p>Because of the nonuniformity of the oxide grown on the rougher polysilicon surface. (D)</p> Signup and view all the answers

What is the solution to the problem of polysilicon having a high resistance to metal materials used for conductive leads?

<p>Using a polycide structure with a multimetal stack of polysilicon and a silicide. (C)</p> Signup and view all the answers

Which of the following is an advantage of LPCVD (Low-Pressure Chemical Vapor Deposition) for metal depositions?

<p>It offers good conformal step coverage and high production rates. (D)</p> Signup and view all the answers

What is the key challenge in filling via holes with metal for effective multimetal systems?

<p>The dielectric layer is relatively thick, and the via holes have a high aspect ratio. (D)</p> Signup and view all the answers

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