Optical Devices: Refractive Index Importance
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Questions and Answers

What effect does increasing current density have on the porosity of a porous silicon layer?

  • It varies unpredictably.
  • It has no effect on porosity.
  • It increases the porosity. (correct)
  • It decreases the porosity.
  • What happens to the refractive index of porous silicon as the current density increases?

  • It decreases exponentially. (correct)
  • It remains constant.
  • It increases linearly.
  • It only decreases at low densities.
  • Which relationship is established during the calibration of the fabrication system?

  • Etching time - porosity relation.
  • Current density - porosity relation.
  • Current density - refractive index relation. (correct)
  • Thickness - refractive index relation.
  • What method is used to calculate the refractive indices of the porous silicon layers?

    <p>Measurement of interference fringes method.</p> Signup and view all the answers

    In the context of the fabrication process, what does a higher porosity typically indicate about the refractive index?

    <p>Higher porosity leads to a lower refractive index.</p> Signup and view all the answers

    What characteristics are essential for the fabrication of porous silicon multilayer devices?

    <p>Current density-refractive index relation and etching time-thickness relation.</p> Signup and view all the answers

    How does the calibration of the fabrication process contribute to the device characteristics?

    <p>It establishes the necessary relationships for predictable outcomes.</p> Signup and view all the answers

    What is the effect of current densities exceeding 70 mA/cm² on porous silicon layers?

    <p>They result in fragile porous layers.</p> Signup and view all the answers

    Why is determining the current density-refractive index relation important for porous silicon layers?

    <p>It is crucial for optimizing optical properties.</p> Signup and view all the answers

    What happens to porous silicon layers when current densities are lower than 10 mA/cm²?

    <p>They show very slow etch rates.</p> Signup and view all the answers

    How does the current density relate to the refractive index of porous silicon based on the provided graph?

    <p>It exhibits exponential dependence.</p> Signup and view all the answers

    Why is it significant to understand the current density-refractive index relation in porous silicon fabrication?

    <p>It allows for the calibration of the porous silicon formation system.</p> Signup and view all the answers

    What is the indicated range of current densities studied for obtaining porous silicon layers?

    <p>10 to 70 mA/cm²</p> Signup and view all the answers

    What is indicated by high current densities regarding the fragility of the porous layers?

    <p>They are frequently detached from the substrate.</p> Signup and view all the answers

    What complication arises from using current densities lower than 10 mA/cm² in fabrication?

    <p>Layer formation is prolonged without significant refractive index gain.</p> Signup and view all the answers

    What does the variation of the refractive index depicted in the figure represent?

    <p>Variation for a wavelength range of 1-4 µm.</p> Signup and view all the answers

    What is the primary parameter essential for the simulation of optical devices as mentioned?

    <p>Refractive index</p> Signup and view all the answers

    What is the relationship between porosity and current density as indicated?

    <p>Porosity increases exponentially with current density.</p> Signup and view all the answers

    Which methods are used for the characterization of porous silicon layers?

    <p>Interference fringes method and spectrum analysis fitting</p> Signup and view all the answers

    Why is porosity described as 'invisible' in the context of fabrication and simulation?

    <p>Because measurements and calculations focus on refractive index and thickness.</p> Signup and view all the answers

    What causes the variation bars plotted for each current density?

    <p>Different reasons related to measurement techniques.</p> Signup and view all the answers

    Study Notes

    Porosity and Refractive Index

    • Porosity is not an essential parameter for the thesis; the refractive index of the layer is the key focus.
    • Thickenss and refractive index are crucial for simulating multilayer optical devices, while porosity is not considered in simulation processes.
    • Although porosity influences the refractive index, it remains largely unaccounted for in both simulation and fabrication.

    Characterization Methods

    • Characterization methods like interference fringes and spectrum analysis fit focus on calculating refractive index and thickness instead of porosity.
    • A relationship between porosity and current density is presented, highlighting potential future applications of porous silicon layers.

    Current Density and Porosity Relationship

    • The relationship between porosity and current density is exponential; as current density increases, porosity also rises.
    • Current density range studied is from 10 to 70 mA/cm².
    • High current densities (over 70 mA/cm²) lead to fragile porous layers, posing a risk of detachment from the substrate.
    • Low current densities (below 10 mA/cm²) produce porous layers with slow etch rates, complicating characterization with scanning electron microscopy (SEM).

    Current Density and Refractive Index Relation

    • The fabricating system calibration establishes a clear relation between current density (J) and refractive index (n).
    • Higher current density results in increased porosity and lower refractive index due to a greater volume of air in the layer.
    • The relationship shows an exponential decrease in refractive index with increasing current density, substantiating findings in existing literature.

    Importance of Calibration

    • Calibration of the fabrication system is essential to link anodization parameters with the physical characteristics of the porous silicon layers.
    • The etching time-thickness relation is also critical, ensuring proper fabrication of multilayer devices.
    • Monolayers produced at various current densities and etching times provide foundational data for device design in subsequent chapters.

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    Description

    Explore the significance of refractive index in the simulation and design of optical devices. This quiz delves into how thickness and refractive index are crucial, while porosity plays a minimal role. Test your understanding of these essential parameters for multilayer optical systems.

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