Thin Films Lecture 3: Electron Beam Heating Technique

The electron beam heating technique is based on the heat produced by high energy electron beam bombardment on the material to be ______

The electron beam is generated by an electron gun, which uses the thermionic emission of electrons produced by an incandescent ______

Emitted electrons are accelerated by a high voltage potential of ______

A magnetic field is often applied to bend the electron ______

As electrons can be focalized, it is possible to obtain localized heating on the material to ______

Factors influencing the preparation of thin films through Electron beam heating include: Electron beam ______

Advantages of vacuum evaporation: High-purity films can be deposited from high-purity source material. Source of material to be vaporized may be a solid in any form and ______.

The properties of the material being deposited, such as its melting point and behavior under heating, influence the deposition process using electron beam heating technique. Deposition rate monitoring and control are relatively ______.

Deposition rate monitoring and control are relatively ______.

Vacuum evaporation is used to form optical interference coatings using high and low index of refraction materials, mirror coatings, decorative coatings, electrically conducting films and corrosion protective ______.

Large-volume vacuum chambers are generally required to keep an appreciable distance between the hot source and the ______.

Many compounds and alloy compositions can only be deposited with ______.