10 Questions
What is the primary function of the H+ ions in the photo acid generator exposure generation process?
To act as a catalyst for chemical amplification
What is the purpose of using strategies to reduce reflection in the context of lithography?
To prevent destructive interference of light waves
What is the term for the points of maximum displacement in a standing wave pattern?
Antinodes
In the context of VLSI technology, what is the primary role of the protection group R?
To make the resin insoluble in base
What is the wavelength of the i-line used in lithography, according to Marc Heyns?
248nm
What is the term for the repeated interference of two waves of identical frequency moving in opposite directions along the same medium?
Standing waves
What is the primary advantage of using chemical amplification in the photo acid generator exposure generation process?
Enhanced sensitivity of the photoresist
What is the term for the points of no displacement in a standing wave pattern?
Nodes
What is the role of the post-exposure bake (PEB) in the photo acid generator exposure generation process?
To initiate the chemical amplification reaction
What is the total thickness of the standing wave pattern in the photoresist, according to the formula?
λ/4n
Learn about optical proximity correction, a crucial step in VLSI technology to avoid line shortening effects and ensure uniform lines. Understand how it works and its importance in chip manufacturing.
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