Podcast
Questions and Answers
What is the primary function of the H+ ions in the photo acid generator exposure generation process?
What is the primary function of the H+ ions in the photo acid generator exposure generation process?
- To create standing waves in the photoresist
- To act as a catalyst for chemical amplification (correct)
- To absorb energy in the resist layer
- To solubilize the resin in the base
What is the purpose of using strategies to reduce reflection in the context of lithography?
What is the purpose of using strategies to reduce reflection in the context of lithography?
- To absorb energy in the resist layer
- To improve the efficiency of the photo acid generator exposure
- To prevent destructive interference of light waves (correct)
- To create standing waves in the photoresist
What is the term for the points of maximum displacement in a standing wave pattern?
What is the term for the points of maximum displacement in a standing wave pattern?
- Wavelengths
- Reflection points
- Nodes
- Antinodes (correct)
In the context of VLSI technology, what is the primary role of the protection group R?
In the context of VLSI technology, what is the primary role of the protection group R?
What is the wavelength of the i-line used in lithography, according to Marc Heyns?
What is the wavelength of the i-line used in lithography, according to Marc Heyns?
What is the term for the repeated interference of two waves of identical frequency moving in opposite directions along the same medium?
What is the term for the repeated interference of two waves of identical frequency moving in opposite directions along the same medium?
What is the primary advantage of using chemical amplification in the photo acid generator exposure generation process?
What is the primary advantage of using chemical amplification in the photo acid generator exposure generation process?
What is the term for the points of no displacement in a standing wave pattern?
What is the term for the points of no displacement in a standing wave pattern?
What is the role of the post-exposure bake (PEB) in the photo acid generator exposure generation process?
What is the role of the post-exposure bake (PEB) in the photo acid generator exposure generation process?
What is the total thickness of the standing wave pattern in the photoresist, according to the formula?
What is the total thickness of the standing wave pattern in the photoresist, according to the formula?
