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VLSI Technology: Optical Proximity Correction

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VLSI Technology: Optical Proximity Correction

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Questions and Answers

What is the primary function of the H+ ions in the photo acid generator exposure generation process?

To create standing waves in the photoresist

To act as a catalyst for chemical amplification (correct)

To absorb energy in the resist layer

To solubilize the resin in the base

What is the purpose of using strategies to reduce reflection in the context of lithography?

To absorb energy in the resist layer

To improve the efficiency of the photo acid generator exposure

To prevent destructive interference of light waves (correct)

To create standing waves in the photoresist

What is the term for the points of maximum displacement in a standing wave pattern?

Wavelengths

Reflection points

Nodes

Antinodes (correct)

In the context of VLSI technology, what is the primary role of the protection group R?

To make the resin insoluble in base Signup and view all the answers

What is the wavelength of the i-line used in lithography, according to Marc Heyns?

248nm Signup and view all the answers

What is the term for the repeated interference of two waves of identical frequency moving in opposite directions along the same medium?

Standing waves Signup and view all the answers

What is the primary advantage of using chemical amplification in the photo acid generator exposure generation process?

Enhanced sensitivity of the photoresist Signup and view all the answers

What is the term for the points of no displacement in a standing wave pattern?

Nodes Signup and view all the answers

What is the role of the post-exposure bake (PEB) in the photo acid generator exposure generation process?

To initiate the chemical amplification reaction Signup and view all the answers

What is the total thickness of the standing wave pattern in the photoresist, according to the formula?

λ/4n Signup and view all the answers