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Questions and Answers
Why is low pressure needed for PVD (physical vapor deposition) and CVD (chemical vapor deposition) thin layer deposition techniques?
What is the main role of plasma in the CVD (Chemical Vapor Deposition) processes?
How is the Depth of Focus (DOF) related to the wavelength (λ) in lithography operations?
What is an important challenge in various deposition techniques related to step coverage?
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What is the main difference between dry etch and wet etch processes?
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What analytical methods are commonly used in semiconductor processing for troubleshooting?
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