Uniformly Doped PN Junction and Space Charge Region

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11 Questions

What is the primary condition for avalanche breakdown to occur in a pn junction?

A sufficiently large reverse-biased voltage is applied

In a one-sided pn junction, what is the breakdown voltage dependent on?

Doping concentration in the low-doped region

What is the characteristic of a hyperabrupt junction?

Doping decreases away from the metallurgical junction

What is the purpose of using specific doping profiles in a pn junction?

To obtain specific capacitance characteristics

What type of pn junction is represented by a linearly graded junction?

Nonuniformly doped junction

What is the function of the space charge region in a uniformly doped pn junction?

Depleted of any mobile electrons or holes

Where does a net positive charge density exist in a uniformly doped pn junction?

n region

What generates the net negative charge density in the p region of a pn junction?

Acceptor impurity ions

What defines the junction capacitance of a pn junction?

Change in charge

What effect does an applied reverse-biased voltage have on the potential barrier in a pn junction?

Increases it

In which direction does the electric field exist in the depletion region of a pn junction?

From n region to p region

Study Notes

Avalanche Breakdown

  • Occurs when a sufficiently large reverse-biased voltage is applied to the pn junction
  • Results in a large reverse-biased current being induced in the pn junction

Breakdown Voltage

  • Derived as a function of the doping concentrations in the pn junction
  • In a one-sided pn junction, the breakdown voltage depends on the doping concentration in the low-doped region

Linearly Graded Junction

  • Represents a nonuniformly doped pn junction
  • Expressions for the electric field, built-in potential barrier, and junction capacitance differ from those of the uniformly doped junction

Hyperabrupt Junction

  • Doping decreases away from the metallurgical junction
  • Advantageous in varactor diodes used in resonant circuits

Uniformly Doped pn Junction

  • Formed by uniformly doping one region of a semiconductor with acceptor impurities and the adjacent region with donor impurities
  • Space charge region (depletion region) is formed on either side of the metallurgical junction

Space Charge Region

  • Depleted of mobile electrons and holes
  • Net positive charge density exists in the n region due to positively charged donor impurity ions
  • Net negative charge density exists in the p region due to negatively charged acceptor impurity ions

Electric Field and Potential Difference

  • Electric field exists in the depletion region due to the net space charge density
  • Direction of the electric field is from the n region to the p region
  • Potential difference exists across the space charge region, known as the built-in potential barrier

Applied Reverse-Biased Voltage

  • Increases the potential barrier, space charge width, and magnitude of the electric field
  • Changes the amount of charge in the depletion region, defining the junction capacitance

Explore the concept of a uniformly doped pn junction and the formation of a space charge region. Learn about the depletion region that separates the n and p regions in a semiconductor.

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