Thin Film Fabrication Methods

EBE is a vacuum-based PVD process used to fabricate thin films and NPs. The EBE system consists of a vacuum unit, an electron beam source, and target materials. The electron beam source consists of a filament heated by passing current through it, generating an electron beam. The beam is then focused and directed onto the target material using magnets. When the electron beam hits the target, it heats the material, causing it to evaporate when the temperature reaches above its boiling point. The evaporated material is then transported and condensed onto the substrate.

The advantages of EBE methods include high deposition rate, the ability to deposit materials ranging from conducting to insulating, and the capability to deposit materials of a higher boiling point compared to thermal evaporation.

Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates. At high laser flux, the material is typically converted to a plasma.

Pulse Laser Deposition (PLD) is a vacuum-based PVD process that employs laser energy to remove material from the target. It differs from Laser Ablation in that PLD specifically uses laser energy to remove material for deposition purposes in a vacuum environment.

The steps involved in the EBE process are: (i) The electron beam hits the target and heats the target material. (ii) The target material (atoms) evaporates when the temperature reaches above its boiling point. (iii) The evaporated material is then transported. (iv) The evaporated material is condensed onto the substrate.