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Questions and Answers
What is the main generic challenge associated with lithography?
What is the main generic challenge associated with lithography?
- Alignment/Registration
- Field
- Throughput (correct)
- Cost
Which technology aspect of sources is important for ensuring high resolution of a focused probe or projected pattern?
Which technology aspect of sources is important for ensuring high resolution of a focused probe or projected pattern?
- Monochromaticity (correct)
- Stability
- Absorption
- Intensity
In projection lithography, what is required for fabrication of each unique pattern?
In projection lithography, what is required for fabrication of each unique pattern?
- Field patterning
- Source technology
- Resist materials
- Mask technology (correct)
What type of exposure is used in the serial or direct write mode?
What type of exposure is used in the serial or direct write mode?
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What characteristics should resist materials have to enable high throughput in lithography?
What characteristics should resist materials have to enable high throughput in lithography?
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