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Nanolithography and Nanopatterning Challenges Quiz
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Nanolithography and Nanopatterning Challenges Quiz

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Questions and Answers

What is the main generic challenge associated with lithography?

  • Alignment/Registration
  • Field
  • Throughput (correct)
  • Cost

    • Which technology aspect of sources is important for ensuring high resolution of a focused probe or projected pattern?

  • Monochromaticity (correct)
  • Stability
  • Absorption
  • Intensity

    • In projection lithography, what is required for fabrication of each unique pattern?

  • Field patterning
  • Source technology
  • Resist materials
  • Mask technology (correct)

    • What type of exposure is used in the serial or direct write mode?

    <p>Point-by-point exposure</p> Signup and view all the answers

    What characteristics should resist materials have to enable high throughput in lithography?

    <p>High sensitivity and high contrast</p> Signup and view all the answers

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