Advantages and Disadvantages of Dry Etching Quiz

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Questions and Answers

Which etching method involves using neutrally-charged, high-energy ions for etching?

Dry etching (correct)

Plasma etching

Wet etching

Radiofrequency etching

What is a disadvantage of wet etching?

Uses expensive equipment

Doesn't use many chemicals

Operators cannot automate the process

Some gasses used are corrosive (correct)

What is an advantage of dry etching over wet etching?

Material removal occurs in the liquid phase

Operators can automate the process (correct)

Less messy process

Doesn't use a large number of chemicals

Which factor affects the etch rate in dry etching processes?

The system design Signup and view all the answers

What is the state of matter that plasma consists of?

Free electrons, ions, and neutrons or molecules in ionized gas form Signup and view all the answers

What is plasma radiation damage associated with?

Effects caused by exposure to plasma's high-energy particles or radiation Signup and view all the answers

What is a key advantage of dry etching over wet etching?

Easier disposal of chemicals Signup and view all the answers

Why is dry etching considered more precise than wet etching?

It causes less undercutting Signup and view all the answers

What is a notable disadvantage of wet etching compared to dry etching?

Operator hazards Signup and view all the answers

Which type of etching is known for directional etching without using the crystal orientation of Si?

Dry etching Signup and view all the answers

Why does dry etching have better process control compared to wet etching?

Ease of automation Signup and view all the answers

What is a significant advantage of dry etching in terms of safety?

Can easily automate the process Signup and view all the answers

What is the purpose of spraying DI water onto the surface of the etched film after using etchants?

To remove the etchants Signup and view all the answers

Which of the following is NOT an advantage of spray etching over immersion technique?

Higher accuracy in removing layers Signup and view all the answers

Why is it important to use etch-resistant materials in a silicon wet etching system?

To prevent deterioration of the machine Signup and view all the answers

What is the main disadvantage associated with silicon wet etching system cost?

High initial investment Signup and view all the answers

Which isotropic etchant is commonly used for Silicon in wet etching?

$HNO_3$ and $HF$ Signup and view all the answers

What advantage does spray etching offer in terms of chemical usage compared to immersion techniques?

Increased chemical efficiency Signup and view all the answers

Study Notes

Dry Etching

Ion beam etching utilizes neutrally-charged, high-energy ions for etching.
Dry etching has better process control than wet etching due to its ability to control the energy, direction, and species of the etching species.
Dry etching is more precise than wet etching because it allows for more control over the shape and size of the etched features.
Plasma is the state of matter that plasma consists of.
Plasma radiation damage is associated with damage to the substrate during etching, which can affect the performance of the device.
Directional etching is achieved with dry etching without relying on the crystal orientation of Silicon.

Wet Etching

Wet etching uses liquid chemicals to remove material from a substrate.
Undercutting is a notable disadvantage of wet etching because it can lead to unwanted etching of features that are not intended to be etched.
Etch rate is a factor that affects the etch rate in dry etching processes.
Isotropic etching is a common characteristic of wet etching, meaning that the etch rate is the same in all directions.
Spray etching uses less chemicals than immersion techniques.
Safety is a significant advantage of dry etching, as it does not involve the use of hazardous chemicals.
Etch-resistant materials are crucial in silicon wet etching systems to protect specific areas of the substrate from being etched.
Silicon wet etching systems are known for their cost, which can be a significant disadvantage.
HF (Hydrofluoric acid) is a commonly used isotropic etchant for Silicon in wet etching.
DI water is sprayed onto the surface of the etched film after using etchants to remove any residual etchants and improve surface cleanliness.
Reduced processing time is not an advantage of spray etching over immersion technique.

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Description

Test your knowledge on the advantages and disadvantages of dry etching, a process that eliminates handling of dangerous acids and solvents, uses small amounts of chemicals, and provides high resolution and cleanliness. Explore concepts like isotropic and anisotropic etch profiles, directional etching, and more.