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Questions and Answers
What is the primary advantage of the 5nm transistor technology node?
What is the primary advantage of the 5nm transistor technology node?
What is the term '5nm' referring to in the context of transistors?
What is the term '5nm' referring to in the context of transistors?
What is the characteristic feature of the FinFET architecture?
What is the characteristic feature of the FinFET architecture?
What is the purpose of the gate wrapping around the fin in the FinFET architecture?
What is the purpose of the gate wrapping around the fin in the FinFET architecture?
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What is the approximate gate length of the 5nm transistor?
What is the approximate gate length of the 5nm transistor?
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What is the effect of a smaller gate pitch on the transistor density?
What is the effect of a smaller gate pitch on the transistor density?
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What is the purpose of increasing the number of fins in the transistor?
What is the purpose of increasing the number of fins in the transistor?
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What is the effect of a smaller metal pitch on the interconnects?
What is the effect of a smaller metal pitch on the interconnects?
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Study Notes
5nm Transistor Specification
- The 5nm transistor is a critical component in advanced semiconductor devices, enabling increased performance, reduced power consumption, and improved density compared to previous technology nodes.
Technology Node
- The 5nm technology node refers to the minimum feature size of the transistor, which is approximately 5 nanometers.
- A smaller technology node allows for more transistors to be packed into a given area, resulting in higher performance and increased functionality.
Transistor Architecture
- The 5nm transistor utilizes the FinFET (Fin Field-Effect Transistor) architecture.
- The FinFET architecture features a thin vertical fin of silicon acting as the transistor's channel, with the gate wrapping around the fin to provide better control over the channel and reduce leakage current.
Key Parameters
- Gate Length (Lg): approximately 5 nanometers, representing the technology node.
- Gate Pitch (GP): approximately 30 nanometers, with a smaller gate pitch allowing for increased transistor density.
- Metal Pitch (MP): approximately 20 nanometers, with a smaller metal pitch allowing for more densely packed interconnects.
- Fin Height (Hfin): approximately 30 nanometers, determining the effective channel width of the transistor and affecting current drive capability.
- Fin Width (Wfin): approximately 5 nanometers, determining the effective channel length and impacting the transistor's on/off characteristics.
- Number of Fins (Nfin): 2 or more, with multiple fins combined to increase the effective channel width and enhance current drive capability.
- Threshold Voltage (Vth): approximately 0.2V to 0.3V, with lower Vth values resulting in improved performance but potentially compromising power efficiency.
- Subthreshold Swing (SS): a key parameter in transistor design, affecting the transistor's performance and power efficiency.
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Description
Learn about the 5nm transistor, a critical component in advanced semiconductor devices, offering improved performance, power consumption, and density.
